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单晶圆/陶瓷片超声波光阻喷涂机
设备特点:
·超声波驱动器可产生120KHz的震荡频率,能将液体雾化成为18µm的液滴。
·Micro flow 多活塞供料系统不仅可连续供料,且可提供1µl/min~25ml/min之间的流量,可满足各式的制程需求。
·超声波喷头是由伺服马达所带动,移动速度最高可达到200mm/sec,且可依照制程规划实时改变速度。
·独特的多孔隙陶瓷加热平台设计,最高可加热到60度,能够同时进行真空吸附及加热晶圆。独立的冷热板槽,适 合对涂布后的晶圆进行Soft bake。
主要技术参数:
Purpose :
Applicable :
Throughput(UPH) :
Chamber Type :
Load / Unload :
Chuck :
Equipment Control :
Process Feature
This equipment can do thin film coating process
8” Wafer PR spray coating
45 pcs (depend on film thickness)
Single wafer ultrasonic spray coating process chamber
2 sets ,open cassette type
Vacuum chuck with heat disk
Touch type IPC + PLC Control
·Wide range of flow rates – 1µl/min to 25ml/min
·High accuracy dispense ±0.5%
·Continuous flow capability
·Up to 80% reduction in material consumption
·Uniformity of film thickness is within ±10%
·Liquid can be atomization with viscosity less than 50cp
·Ultrasonic driver power levels are generally under 15 watts
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